Share Email Print
cover

Proceedings Paper

Extremely fine-pitch printing with a 10X Schwarzschild optic at extreme-ultraviolet wavelengths
Author(s): Michael D. Shumway; Sang Hun Lee; Chang Hyun Cho; Patrick P. Naulleau; Kenneth A. Goldberg; Jeffrey Bokor
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We demonstrate the use of a 13.4-nm wavelength, 10x-demagnification Schwarzschild optical system to expose high-resolution test patterns, extending well beyond the conventional resolution limit to dense feature sizes of 50 nm and below. We have successfully used a spatial frequency doubling technique to print equal line and space patterns with line widths as small as 30 nm. Simulations show that by using the fully extended numerical aperture, the system may achieve line widths as small as 12 nm. This configuration shows great potential for use in evaluating the ultimate performance and extendibility of resist materials for EUV lithography.

Paper Details

Date Published: 20 August 2001
PDF: 6 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436690
Show Author Affiliations
Michael D. Shumway, Univ. of California/Berkeley and Lawrence Berkeley National Lab. (United States)
Sang Hun Lee, Univ. of California/Berkeley and Lawrence Berkeley National Lab. (United States)
Chang Hyun Cho, Univ. of California/Berkeley and Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Univ. of California/Berkeley and Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top