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Proceedings Paper

Laser-induced EUV source for optics characterization
Author(s): Sebastian Kranzusch; Klaus R. Mann
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Paper Abstract

A laser-based EUV plasma source for diagnostics purposes was developed, which is going to be utilized primarily for characterization of EUV optical components and sensoric devices. The emission characteristics of the generated 13nm radiation is monitored by the help of different diagnostic tools, including a pinhole camera, an EUV spectrometer and various EUV photodiodes. Moreover, first wavefront measurements of EUV radiation were performed with the help of a specially designed wavefront analyzer based on the Hartmann-Shack principle, which was sensibilized for 13nm radiation.

Paper Details

Date Published: 20 August 2001
PDF: 7 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436688
Show Author Affiliations
Sebastian Kranzusch, Laser-Lab. Goettingen eV (Germany)
Klaus R. Mann, Laser-Lab. Goettingen eV (Germany)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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