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Proceedings Paper

Advanced point diffraction interferometer for EUV aspherical mirrors
Author(s): Kazuya Ota; Takahiro Yamamoto; Yusuke Fukuda; Katsura Otaki; Iwao Nishiyama; Shinji Okazaki
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Paper Abstract

An advanced point diffraction interferometer for measuring EUV aspherical mirrors with high accuracy has been developed. It is designed for measuring various EUV mirrors with high accuracy and high precision. It can measure the surface figure of all mirrors that will be used in high numerical aperture systems. Using this interferometer, 0.1nm rms precision and 0.2nm rms accuracy are expected.

Paper Details

Date Published: 20 August 2001
PDF: 8 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436686
Show Author Affiliations
Kazuya Ota, Association of Super-Advanced Electronics Technologies (Japan)
Takahiro Yamamoto, Association of Super-Advanced Electronics Technologies (Japan)
Yusuke Fukuda, Association of Super-Advanced Electronics Technologies (Japan)
Katsura Otaki, Association of Super-Advanced Electronics Technologies (Japan)
Iwao Nishiyama, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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