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Proceedings Paper

Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography
Author(s): Ulrich Vogt; Holger Stiel; Ingo Will; Marek Wieland; Thomas Wilhein; Peter Viktor Nickles; Wolfgang Sandner
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Paper Abstract

In this article we describe a laser plasma source for Extreme Ultraviolet Lithography (EUVL) based on a liquid water jet target. Although jet targets are known for some time now, no attempts have been made to prove the functionality of the target under conditions similar to an EUVL production-line facility, that means illumination with high average power laser systems (in the multi-kW regime) at repetition rates in the kHz region. Such systems are currently under development. We used the MBI-burst laser to simulate these extreme illumination conditions. We examined the hydrodynamic stability of the target as a function of the laser repetition rate at different average laser powers (0.6kW and 5kW per burst). Additionally, the dependence of the conversion efficiency on pulse duration in the range from 30ps to 3ns was investigated. From our results one can conclude parameters for future design of driver lasers for EUVL systems.

Paper Details

Date Published: 20 August 2001
PDF: 8 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436685
Show Author Affiliations
Ulrich Vogt, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Holger Stiel, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Ingo Will, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Marek Wieland, Univ. of Applied Sciences (Netherlands)
Thomas Wilhein, Univ. of Applied Sciences (Germany)
Peter Viktor Nickles, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)
Wolfgang Sandner, Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (Germany)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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