Share Email Print

Proceedings Paper

Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography
Author(s): Henryk Fiedorowicz; Andrzej Bartnik; Hiroyuki Daido; Roman Jarocki; Rafal Rakowski; Masayuki Suzuki; Miroslaw Szczurek; Susumu Yamagami
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Generation of x-ray and extreme ultraviolet (EUV) radiation from laser-produced source with a new double-stream gas puff target has been investigated. The target was formed by pulsed injection of heavy gas (argon, or xenon) into a hollow gas stream from helium by using a double-nozzle setup. This new approach allows to form a high-density gaseous target at a relatively large distance from the nozzle output. X-ray emission was produced by irradiation of the argon/helium target with pulses of 1 ns time duration with energy up to 20 J from a Nd:glass laser. Strong x-ray emission at the wavelength near 0.4 nm from the argon target, similar to the emission from the solid sulphur target irradiated in the same conditions, have been observed. These new results may be useful to develop a laser-produced radiation source for x-ray lithography. To generate EUV radiation the xenon/helium target was irradiated using a Nd:YAG laser producing pulses of 10 ns and 0.7 J or energy. Efficient production near 11 nm from the xenon target exceeding emissions from solid targets was observed that should be useful for EUV lithography.

Paper Details

Date Published: 20 August 2001
PDF: 10 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436680
Show Author Affiliations
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Hiroyuki Daido, Osaka Univ. (Japan)
Roman Jarocki, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
Masayuki Suzuki, Osaka Univ. (Japan)
Miroslaw Szczurek, Military Univ. of Technology (Poland)
Susumu Yamagami, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top