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Proceedings Paper

Advances in graft polymerization lithography
Author(s): Colin J. Brodsky; Brian C. Trinque; Heather F. Johnson; C. Grant Willson
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Paper Abstract

New microlithography patterning technologies must be developed in order to meet the demands of advanced semiconductor manufacturing. This paper describes the development of a new top surface imaging technique that is designed to circumvent the difficulties associated with developing next generation single layer resists. Graft polymerization lithography is an extension of top surface imaging in which exposure creates an acidic surface that activates monomer deposition on top of the base layer. Silicon-containing monomers were synthesized in order to meet the graft polymerization process requirements. A QCM-monitored deposition system was developed to study the fundamental behavior of the deposition process as a function of temperature, pressure, and photoacid generator (PAG) loading. Volumetric, bulk polymer sorption measurements were used to provide insight into the critical sorption behavior that drives the deposition process. These fundamental studies led to a proposed process mechanism that explains the experimentally observed behavior. Finally, proof of concept imaging experiments were conducted that demonstrate the graft polymerization process through all lithographic steps.

Paper Details

Date Published: 20 August 2001
PDF: 12 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436660
Show Author Affiliations
Colin J. Brodsky, Univ. of Texas/Austin (United States)
Brian C. Trinque, Univ. of Texas/Austin (United States)
Heather F. Johnson, Univ. of Texas/Austin (United States)
C. Grant Willson, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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