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Proceedings Paper

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
Author(s): Nobuyuki N. Matsuzawa; Shigeo Irie; Ei Yano; Shinji Okazaki; Akihiko Ishitani
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Paper Abstract

A theoretical comparison between the linear absorption coefficients at EUV wavelengths of 13 nm and 11 nm for more than 140 polymers revealed that the absorbance of organic polymers at 11 nm is ~30% lower than that at 13 nm. IN addition, the effects of oxygen content and density on the absorbance at 13 nm was theoretically investigated for organic polymers containing oxygen atoms. This investigation showed that, for organic polymers with about half the oxygen content of Novolak, the transmittance is 50% at a thickness of 200 nm and 60% at 140 nm. This further means that at 11 nm, the transmittance of the polymers should be 60% at 200 nm and 70% at 140 nm. These results suggest that a single-layer resist (SLR) process may very well be suitable for EUV resist processes. Further theoretical studies on silicon-containing polymers showed that, for a thickness of 200 nm and a wavelength of 13 nm, the transmittance would be in the range of 40-45% for silsequioxane polymers with some organic hydrocarbon parts, and in the range of 45-50% for siloxane polymers with some organic hydrocarbon parts.

Paper Details

Date Published: 20 August 2001
PDF: 7 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436657
Show Author Affiliations
Nobuyuki N. Matsuzawa, Association of Super-Advanced Electronics Technologies (Japan)
Shigeo Irie, Association of Super-Advanced Electronics Technologies (Japan)
Ei Yano, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)
Akihiko Ishitani, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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