Share Email Print

Proceedings Paper

Impact of positive ions and effect of lens aberrations in projection electron-beam systems
Author(s): Bo Wu; Andrew R. Neureuther
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The Berkeley Electron Beam Simulator (BEBS) has been used with positive particles and induced lens aberrations to diagnose and partially compensate beam blur at high current. Simulation shows up to a 24% spot size reduction at 30(mu) A beam current with positive ions introduced in the beam column. Results also show that a proper amount of lens aberration can partially cancel the aberration induced by the global space charge effect. Over a 30% beam blur reduction has been achieved at 30(mu) A beam current. A 30(mu) A simulation requires roughly one hour with ten 500MHz processors. Results are also reported for using BEBS with both positrons and electrons as a stochastic effect simulator. This enables the isolation of the stochastic coulomb interactions from the space charge effect in any beam configuration and the direct measurement of the stochastic beam blur. Our simulation shows that the stochastic blur scales proportionally to I0.62, in comparison with Jansen's prediction of I0.67, where I is the beam current.

Paper Details

Date Published: 20 August 2001
PDF: 8 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436641
Show Author Affiliations
Bo Wu, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top