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Proceedings Paper

High-power copper vapor laser development
Author(s): Nobutada Aoki; Hironobu Kimura; Chikara Konagai; Shimpey Shirayama; Tatsuo Miyazawa; Tomoyuki Takahashi
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Paper Abstract

Copper vapor laser (CVL) devices of 60 mm bore have been developed for atomic vapor laser isotope separation, and recently an average power per device of over 200W (211W maximum) has been achieved by expanding the discharge length to 3000 mm. In order to further improve the power output by increasing the discharge volume, it is important to supply discharge energy efficiently to the laser tube and to maintain the optimum copper vapor density in the larger volume. Now a CVL discharge circuit has been designed using a CVL discharge simulation code able to calculate time-dependent plasma resistance. In addition, a thermal insulation structure that effectively maximizes the laser gain volume has been designed using a thermal simulation code that takes thermal conduction and emission loss from the tube ends into account. This code yields results which show good agreement with experimental data. The results demonstrate that codes which simulate electrical and thermal characteristics are effective tools in the design of high-power CVL devices. In this paper, the methods of designing CVL electrical circuits and laser head structures using CVL simulation codes are reported, and some resulting high-power devices are discussed.

Paper Details

Date Published: 1 May 1991
PDF: 10 pages
Proc. SPIE 1412, Gas and Metal Vapor Lasers and Applications, (1 May 1991); doi: 10.1117/12.43628
Show Author Affiliations
Nobutada Aoki, Toshiba Nuclear Engineering Lab. (Japan)
Hironobu Kimura, Toshiba Nuclear Engineering Lab. (Japan)
Chikara Konagai, Toshiba Nuclear Engineering Lab. (Japan)
Shimpey Shirayama, Toshiba Nuclear Engineering Lab. (Japan)
Tatsuo Miyazawa, Toshiba Nuclear Engineering Lab. (Japan)
Tomoyuki Takahashi, Laser Atomic Separation Engineering Research Assoc. of Japan (Japan)


Published in SPIE Proceedings Vol. 1412:
Gas and Metal Vapor Lasers and Applications
Jin J. Kim; Frank K. Tittel, Editor(s)

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