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Proceedings Paper

SVG 157-nm lithography technical review
Author(s): Thomas J. Fahey; James A. McClay; Matthew E. Hansen; Bruce A. Tirri; Matthew Lipson
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Paper Abstract

SVG Lithography (SVGL) has established and is executing a comprehensive program for the development of an advanced 157 nm Lithography Exposure System capable of processing 70 nm critical dimensions for three years now. This paper presents the approach, and details the present state of the challenges in the development of 157 nm lithography. It also describes the SVGL 157 nm program approach and provides some insight into the progress made to date addressing the challenges. Specific attention is paid to addressing 3 critical areas: Molecular contamination/purging, optical coating, and optical surfacing.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435789
Show Author Affiliations
Thomas J. Fahey, SVG Lithography Systems, Inc. (United States)
James A. McClay, SVG Lithography Systems, Inc. (United States)
Matthew E. Hansen, SVG Lithography Systems, Inc. (United States)
Bruce A. Tirri, SVG Lithography Systems, Inc. (United States)
Matthew Lipson, SVG Lithography Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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