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Proceedings Paper

Evaluation of new mask materials for improved lithography performance
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Paper Details

Date Published: 14 September 2001
PDF: 4 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435782
Show Author Affiliations
Bryan S. Kasprowicz, Photronics, Inc. (United States)
Richard Priestley, Corning Inc. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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