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Proceedings Paper

High-transmission attenuated PSM as a viable optical extension technique
Author(s): Nishrin Kachwala
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Paper Details

Date Published: 14 September 2001
PDF: 11 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435781
Show Author Affiliations
Nishrin Kachwala, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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