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Proceedings Paper

Application of attenuated phase-shifting masks to sub-130-nm lithography
Author(s): Chee Kiong Koo; Lay Cheng Choo; Qunying Lin; Shyue Seng Tan; Hui Jun Lee; Siu Chung Tam; Alex K. See
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Paper Details

Date Published: 14 September 2001
PDF: 11 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435778
Show Author Affiliations
Chee Kiong Koo, Nanyang Technological Univ. (Singapore)
Lay Cheng Choo, Chartered Semiconductor Manufacturing, Ltd. (Singapore)
Qunying Lin, Chartered Semiconductor Manufacturing, Ltd. (Singapore)
Shyue Seng Tan, Nanyang Technological Univ. (Singapore)
Hui Jun Lee, Nanyang Technological Univ. (Singapore)
Siu Chung Tam, Nanyang Technological Univ. (Singapore)
Alex K. See, Chartered Semiconductor Manufacturing, Ltd. (Singapore)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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