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Proceedings Paper

Random pattern formation by attenuated non-phase-shift assist pattern mask
Author(s): Shuji Nakao; Akira Tokui; Kouichirou Tsujita; Ichiriou Arimoto; Wataru Wakamiya
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Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435777
Show Author Affiliations
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Akira Tokui, Mitsubishi Electric Corp. (Japan)
Kouichirou Tsujita, Mitsubishi Electric Corp. (Japan)
Ichiriou Arimoto, Mitsubishi Electric Corp. (Japan)
Wataru Wakamiya, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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