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Proceedings Paper

Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography
Author(s): Sang-Sool Koo; Sang-Jin Kim; Seung-Weon Paek; Chang-Nam Ahn; Young-Mog Ham; Ki-Soo Shin
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Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435776
Show Author Affiliations
Sang-Sool Koo, Hyundai Electronics Industries Co., Ltd. (South Korea)
Sang-Jin Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Seung-Weon Paek, Hyundai Electronics Industries Co., Ltd. (South Korea)
Chang-Nam Ahn, Hyundai Electronics Industries Co., Ltd. (South Korea)
Young-Mog Ham, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Soo Shin, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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