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Proceedings Paper

Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
Author(s): Sung-Woo Lee; Dong-Hoon Chung; In-Gyun Shin; Yong-Hoon Kim; Seong-Woon Choi; Woo-Sung Han; Jung-Min Sohn
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Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435775
Show Author Affiliations
Sung-Woo Lee, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
In-Gyun Shin, Samsung Electronics Co., Ltd. (South Korea)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong-Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Jung-Min Sohn, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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