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Proceedings Paper

Alternating phase-shifting mask application: effect of width and geometry of shifters, 3D EMF simulation and experimental verification
Author(s): Armin Semmler; Annika Elsner; Roderick Koehle; Leonhard Mader; Rainer Pforr; Christoph Noelscher; Christoph M. Friedrich; Juergen Knobloch; Uwe A. Griesinger
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Paper Details

Date Published: 14 September 2001
PDF: 11 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435773
Show Author Affiliations
Armin Semmler, Infineon Technologies AG (Germany)
Annika Elsner, Infineon Technologies AG (Germany)
Roderick Koehle, Infineon Technologies AG (Germany)
Leonhard Mader, Infineon Technologies AG (Germany)
Rainer Pforr, Infineon Technologies Dresden (Germany)
Christoph Noelscher, Infineon Technologies AG (Germany)
Christoph M. Friedrich, Infineon Technologies AG (Germany)
Juergen Knobloch, Infineon Technologies AG (Germany)
Uwe A. Griesinger, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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