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Proceedings Paper

Alternating PSM mask performance: a study of multiple fabrication technique results
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Paper Abstract

In this paper we will discuss the results obtained from five alternating aperture phase-shifting masks (altPSM), each with an identical layout but manufactured using a different technique. We will show the results obtained for mask CD performance measured on a SEM for a number of dimensions and duty cycles. We will show how the results obtained from conventional mask metrology compare with results from advanced analysis including mask topography information obtained using an automated atomic force microscope (AFM). Comparison will be made showing how the metrology structures on the mask compare to the actual structures in the patterning area. A comparison of the results achieved from each mask manufacturing technique will also be made.

Paper Details

Date Published: 14 September 2001
PDF: 6 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435771
Show Author Affiliations
Martin McCallum, International SEMATECH (United States)
Patricia Gabella, International SEMATECH (United States)
Gilbert V. Shelden, International SEMATECH (United States)
Kevin Kjoller, Veeco Instruments Inc. (United States)
Edward Kirk Miller, Veeco Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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