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Proceedings Paper

Lens aberration control for fine patterning with PSM
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Paper Abstract

The impact of lens aberration on linewidth control and pattern shift is investigated with aerial image simulation using Zernike sensitivity method through focus to secure sufficient depth-of-focus (DOF). We found 0 and even theta component has large amount of impact on linewidth control in defocused condition due to best focus shift. This phenomenon makes degradation of DOF performance. For actual phase shift mask (PSM) application, DOF performance is very important, so as to reduce the focus shift by lens aberration, and the lens is controlled with pre-correction of best focus deviation in the field. This method is effective to obtain large DOF with PSM.

Paper Details

Date Published: 14 September 2001
PDF: 10 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435769
Show Author Affiliations
Takehito Kudo, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Koichi Matsumoto, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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