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Proceedings Paper

UV cleaning of contaminated 157-nm reticles
Author(s): Theodore M. Bloomstein; Vladimir Liberman; Mordechai Rothschild; N. N. Efremow; D. E. Hardy; Stephen T. Palmacci
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Paper Abstract

A UV-lamp-based cleaning station, serving as a load-lock to a VUV spectrometer, has been used to evaluate the cleaning of hydrocarbon residues on 157-nm reticles. UV lamp based cleaning is found to be an effective tool to remove both nanometer scale layers of physisorbed and significantly more resilient highly conjugated 'graphitized' layers on the mask substrate. Slight changes in reflectance and surface roughness are observed on the chromium absorber indicating some degree of photo-oxidation is occurring during lamp cleaning.

Paper Details

Date Published: 14 September 2001
PDF: 7 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435764
Show Author Affiliations
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
N. N. Efremow, MIT Lincoln Lab. (United States)
D. E. Hardy, MIT Lincoln Lab. (United States)
Stephen T. Palmacci, MIT Lincoln Lab. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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