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Proceedings Paper

Present status of development of gas-purging and chemically clean technologies at ASET
Author(s): Yasuaki Fukuda; Seiji Takeuchi; Takashi Aoki; Soichi Owa; Fumika Yoshida; Youichi Kawasa; Akira Sumitani; Keiji Egawa; Takehito Watanabe; Kiyoharu Nakao
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Paper Abstract

Purging and contamination are two important issues that need to be treated in order to realize F2 laser lithography system. For the purpose of developing gas-purging and chemically clean technologies, we designed and constructed an experimental set-up. It is used for the study of purging and out-gassing evaluation in order to obtain useful data for development of exposure system. Preliminary experiments showed that purging condition has a strong effect on the residual oxygen and water concentration in the final gas-replaced atmosphere. And we have found that the amount of out-gas depends on the surface finish method of the material used through analyses of impurity gas examination with or without laser irradiation.

Paper Details

Date Published: 14 September 2001
PDF: 10 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435763
Show Author Affiliations
Yasuaki Fukuda, Association of Super-Advanced Electronics Technologies (Japan)
Seiji Takeuchi, Association of Super Advanced Electronics Technologies (Japan)
Takashi Aoki, Association of Super Advanced Electronics Technologoes (Japan)
Soichi Owa, Association of Super-Advanced Electronics Technologies (Japan)
Fumika Yoshida, Association of Super Advanced Electronics Technologies (Japan)
Youichi Kawasa, Association of Super Advanced Electronics Technologies (Japan)
Akira Sumitani, Association of Super Advanced Electronics Technologies (Japan)
Keiji Egawa, Association of Super Advanced Electronics Technologies (Japan)
Takehito Watanabe, Association of Super Advanced Electronics Technologies (Japan)
Kiyoharu Nakao, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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