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Proceedings Paper

High-numerical-aperture 193-nm exposure tool
Author(s): Harry Sewell; Daniel R. Cote; David M. Williamson; Mark L. Oskotsky; Lev Sakin; Tim O'Neil; John D. Zimmerman; Richard Zimmerman; Mike Nelson; Christopher J. Mason; David Ahouse; Hilary G. Harrold; Philip Lamastra; David Callan
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Paper Abstract

As the semiconductor industry accelerates the pace of change, a shift in exposure wavelength from 248 nm to 193 nm becomes inevitable. Correspondingly, the change to a shorter wavelength and the desire to maintain productivity, necessitates a fundamental reassessment of system design approach. Evaluation of resolution and k-factor for a lithographic tool operating at 193 nm and 0.75 numerical aperture indicates that 130 nm node production will be manageable with binary mask, and that performance consistent with 100 nm node requirements and potentially beyond will be achievable with the use of advanced lithographic techniques. This paper reviews the design, system performance analysis and early results for a full-field catadioptric lithography tool operating at numerical apertures up to 0.75 NA.

Paper Details

Date Published: 14 September 2001
PDF: 15 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435758
Show Author Affiliations
Harry Sewell, SVG Lithography Systems, Inc. (United States)
Daniel R. Cote, SVG Lithography Systems, Inc. (United States)
David M. Williamson, SVG Lithography Systems, Inc. (United Kingdom)
Mark L. Oskotsky, SVG Lithography Systems, Inc. (United States)
Lev Sakin, SVG Lithography Systems, Inc. (United States)
Tim O'Neil, SVG Lithography Systems, Inc. (United States)
John D. Zimmerman, SVG Lithography Systems, Inc. (United States)
Richard Zimmerman, SVG Lithography Systems, Inc. (United States)
Mike Nelson, SVG Lithography Systems, Inc. (United States)
Christopher J. Mason, SVG Lithography Systems, Inc. (United States)
David Ahouse, SVG Lithography Systems, Inc. (United States)
Hilary G. Harrold, SVG Lithography Systems, Inc. (United States)
Philip Lamastra, SVG Lithography Systems, Inc. (United States)
David Callan, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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