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Proceedings Paper

Optical design forms for DUV and VUV microlithographic processes
Author(s): James E. Webb; Julie Bentley; Paul F. Michaloski; Anthony R. Phillips; Ted Tienvieri
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Paper Abstract

Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic processes. Refractive and catadioptric design solutions using fused silica, calcium fluoride and other crystals are discussed. Several reflective and catadioptric design forms having central obscurations will be compared to refractive forms. Design complexity, performance and limitations are compared.

Paper Details

Date Published: 14 September 2001
PDF: 11 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435754
Show Author Affiliations
James E. Webb, Tropel Corp. (United States)
Julie Bentley, Tropel Corp. (United States)
Paul F. Michaloski, Tropel Corp. (United States)
Anthony R. Phillips, Tropel Corp. (United States)
Ted Tienvieri, Tropel Corp. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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