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Proceedings Paper

New projection lens system for KrF exposure scanning tool
Author(s): Tomoyuki Matsuyama; Junichi Misawa; Yuichi Shibazaki
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Paper Abstract

In this paper we review our newly developed high NA projection lens for KrF scanner (NSR-S205C.) The projection lens has 0.75 NA and small residual aberration. In a designing step, aspherical surfaces are utilized to decrease lens dimensions without degradation of the lens performance. Actual lens performance, which includes wavefront aberration, distortion, image plane flatness and resist profiles, is reviewed.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435753
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Junichi Misawa, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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