Share Email Print

Proceedings Paper

Method to predict CD variation caused by dynamic scanning focus errors
Author(s): Tsuneyuki Hagiwara; Hideo Mizutani; Shinichi Okita; Naoto Kondo
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

From 1970s IC industry has made dramatic progress due to the advancement of photo- lithography technology. At the beginning of the 21st century, photo- lithography technologies are still acting the major role of manufacturing the leading edge devices. The requirement for the higher resolution is pushing up the NA of the projection lens. As the result, DOF becomes shallower and the focus budget becomes tight. Close study for the focus error impact to CD variation becomes more and more important. A method to predict focus error induced CD variations resulting from dynamic wafer scanning has been developed. CD variations across an exposure image field are calculated from a CD lookup table that relates a CD value to the monitored focus error components.

Paper Details

Date Published: 14 September 2001
PDF: 12 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435741
Show Author Affiliations
Tsuneyuki Hagiwara, Nikon Corp. (Japan)
Hideo Mizutani, Nikon Corp. (Japan)
Shinichi Okita, Nikon Corp. (Japan)
Naoto Kondo, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top