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Proceedings Paper

Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners
Author(s): Mark Terry; Ivan Lalovic; Gregory M. Wells; Adlai H. Smith
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Paper Abstract

In this paper we study the effects of changing the operating laser wavelength on the projection lens aberrations of KrF and ArF scanners as measured by the Litel In-Situ Interferometer. Specifically, we quantify the change in 28 individual Zernike coefficients as a function of wavelength as well as the total RMS. Effects on Zernike's exhibiting a field dependent behavior are described in detail. We convert the Z4 terms to Z positions to estimate the displacement of the image plane, and we identify a new chromatic distortion term. Finally, we input the measured wavefronts into a lithographic simulator to estimate the full effects on image placement error.

Paper Details

Date Published: 14 September 2001
PDF: 10 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435740
Show Author Affiliations
Mark Terry, Texas Instruments Inc. (United States)
Ivan Lalovic, Cymer, Inc. (United States)
Gregory M. Wells, Texas Instruments Inc. (United States)
Adlai H. Smith, Litel Instruments (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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