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Proceedings Paper

Statistical method for influence of exposure and focus error on CD variation
Author(s): Shoji Mimotogi
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Paper Abstract

Lithographic process fluctuations are treated as statistical values and reduced to effective exposure and focus error. The distribution function of CD is derived in the analytical formula in order to calculate CD yield which is important to device characteristics. The process fluctuations are represented as a summation of mean value for interval of process control and deviation from the mean value. New process window for the mean values is proposed using the CD yield. The process window expands when the frequency of process control increases. Quantitative evaluation is performed under the allowable CD yield.

Paper Details

Date Published: 14 September 2001
PDF: 6 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435730
Show Author Affiliations
Shoji Mimotogi, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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