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Proceedings Paper

100-nm node lithography with KrF?
Author(s): Michael Fritze; Brian Tyrrell; David K. Astolfi; Donna Yost; Paul Davis; Bruce Wheeler; Renee D. Mallen; J. Jarmolowicz; Susan G. Cann; Hua-Yu Liu; M. Ma; David Y. Chan; Peter D. Rhyins; Chris Carney; John E. Ferri; B. A. Blachowicz
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Paper Abstract

We present results looking into the feasibility of 100-nm Node imaging using KrF, 248-nm, exposure technology. This possibility is not currently envisioned by the 1999 ITRS Roadmap which lists 5 possible options for this 2005 Node, not including KrF. We show that double-exposure strong phase- shift, combined with two mask OPC, is capable of correcting the significant proximity effects present for 100-nm Node imaging at these low k1 factors. We also introduce a new PSM Paradigm, dubbed 'GRATEFUL,' that can image aggressive 100-nm Node features without using OPC. This is achieved by utilizing an optimized 'dense-only' imaging approach. The method also allows the re-use of a single PSM for multiple levels and designs, thus addressing the mask cost and turnaround time issues of concern in PSM technology.

Paper Details

Date Published: 14 September 2001
PDF: 14 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435719
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Brian Tyrrell, MIT Lincoln Lab. (United States)
David K. Astolfi, MIT Lincoln Lab. (United States)
Donna Yost, MIT Lincoln Lab. (United States)
Paul Davis, MIT Lincoln Lab. (United States)
Bruce Wheeler, MIT Lincoln Lab. (United States)
Renee D. Mallen, MIT Lincoln Lab. (United States)
J. Jarmolowicz, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
Hua-Yu Liu, Numerical Technologies, Inc. (United States)
M. Ma, Numerical Technologies, Inc. (United States)
David Y. Chan, Photronics, Inc. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Chris Carney, Arch Chemicals, Inc. (United States)
John E. Ferri, Arch Chemicals, Inc. (United States)
B. A. Blachowicz, Arch Chemicals, Inc. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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