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Proceedings Paper

Roles of NA, sigma, and lambda in low-k1 aerial image formation
Author(s): Peter D. Brooker
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Paper Abstract

The purpose of this paper is to introduce the fundamental concepts needed to understand the roles of NA, sigma and lambda in aerial image formation for low k1 equals CD/((lambda) /NA) applications. Starting with an idealized representation of the condenser and projection optics in a stepper, the definitions of NA and sigma will be rigorously developed. Next the aerial image will be related to source illumination pattern at the objective pupil that includes the effect of diffraction by the reticle. The initial case considered will be for dense lines and spaces. Off Axis Illumination OAI will then be presented to show exactly what it is and how it can result in increased resolution. The cases of semi-isolated lines and spaces are also be addressed. Also included will be a detailed derivation of the diffraction equations for dense lines and spaces not found in text books.

Paper Details

Date Published: 14 September 2001
PDF: 12 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435713
Show Author Affiliations
Peter D. Brooker, Motorola (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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