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Proceedings Paper

SCAA mask exposures and Phase Phirst designs for 100 nm and below
Author(s): Marc D. Levenson; Takeaki Ebihara; Mikio Yamachika
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Paper Details

Date Published: 14 September 2001
PDF: 10 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435709
Show Author Affiliations
Marc D. Levenson, MDL Consulting (United States)
Takeaki Ebihara, Canon USA, Inc. (United States)
Mikio Yamachika, JSR Corp. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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