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Proceedings Paper

Depth-of-focus analysis of subwavelength features
Author(s): Terence C. Barrett
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Paper Abstract

As the smallest desired feature dimensions decrease ever further below the wavelength of the imaging light, as the numerical aperture of the projection optics continues to increase, and as more degrees of freedom in exposure system setup are made available, so new attention is needed on the parameter space used to establish manufacturable process latitude. A detailed analysis of depth-of-focus data is presented for isolated lines which comprehends the effects of dynamic focal plane error, scan-direction dependence, non-quadratic through-focus behavior, measurement noise, and aberration content. This analysis is applied in a case study of the lens and stage adjustment process for a new exposure system.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435704
Show Author Affiliations
Terence C. Barrett, IBM Microelectronics Div. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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