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Proceedings Paper

Introduction of new techniques for matching overlay enhancement
Author(s): Takahisa Kikuchi; Yuuki Ishii; Noriaki Tokuda
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Paper Abstract

This paper discusses two new techniques that have been developed to improve overlay matching accuracy over multiple wafer scanners: Super Distortion Matching system (SDM) and Grid Compensation for Matching (GCM), and actual data from experiments performed using the techniques. Overlay matching errors can be divided into the two basic categories, intra-shot error and inter-shot error, which can be improved by SDM and GCM, respectively.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435702
Show Author Affiliations
Takahisa Kikuchi, Nikon Corp. (Japan)
Yuuki Ishii, Nikon Corp. (Japan)
Noriaki Tokuda, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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