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Proceedings Paper

LAVA web-based remote simulation: enhancements for education and technology innovation
Author(s): Sang Il Lee; Ka Chun Ng; Takashi Orimoto; Jason Pittenger; Toshi Horie; Konstantinos Adam; Mosong Cheng; Ebo H. Croffie; Yunfei Deng; Frank E. Gennari; Thomas V. Pistor; Garth Robins; Mike V. Williamson; Bo Wu; Lei Yuan; Andrew R. Neureuther
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Paper Abstract

The Lithography Analysis using Virtual Access (LAVA) web site at http://cuervo.eecs.berkeley.edu/Volcano/ has been enhanced with new optical and deposition applets, graphical infrastructure and linkage to parallel execution on networks of workstations. More than ten new graphical user interface applets have been designed to support education, illustrate novel concepts from research, and explore usage of parallel machines. These applets have been improved through feedback and classroom use. Over the last year LAVA provided industry and other academic communities 1,300 session and 700 rigorous simulations per month among the SPLAT, SAMPLE2D, SAMPLE3D, TEMPEST, STORM, and BEBS simulators.

Paper Details

Date Published: 14 September 2001
PDF: 7 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435691
Show Author Affiliations
Sang Il Lee, Univ. of California/Berkeley (United States)
Ka Chun Ng, Univ. of California/Berkeley (United States)
Takashi Orimoto, Univ. of California/Berkeley (United States)
Jason Pittenger, Univ. of California/Berkeley (United States)
Toshi Horie, Univ. of California/Berkeley (United States)
Konstantinos Adam, Univ. of California/Berkeley (United States)
Mosong Cheng, Univ. of California/Berkeley (United States)
Ebo H. Croffie, Univ. of California/Berkeley (United States)
Yunfei Deng, Univ. of California/Berkeley (United States)
Frank E. Gennari, Univ. of California/Berkeley (United States)
Thomas V. Pistor, Univ. of California/Berekely (United States)
Garth Robins, Univ. of California/Berkeley (United States)
Mike V. Williamson, Univ. of California/Berkeley (United States)
Bo Wu, Univ. of California/Berkeley (United States)
Lei Yuan, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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