Share Email Print
cover

Proceedings Paper

Printing high-density patterns with dark-field 193-nm lithography
Author(s): Obert R. Wood; Donald L. White; Donald M. Tennant; Raymond A. Cirelli; James R. Sweeney; Myrtle I. Blakey; Joseph E. Griffith
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In dark-field (DF) lithography, light from the condenser illuminates the reticle at such a steep angle that non- diffracted light is lost from the system. A DF reticle contains a series of sub-resolution amplitude gratings to diffract light from the condenser into the projection lens and, thus, to precisely control the amplitude, phase and direction of light from every point on the reticle. In this paper we show how DF lithography can be used to print high- density patterns at higher contrast than is currently possible with conventional 193-nm lithography in a single exposure.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435686
Show Author Affiliations
Obert R. Wood, Lucent Technologies/Bell Labs. (United States)
Donald L. White, Lucent Technologies/Bell Labs. (United States)
Donald M. Tennant, Lucent Technologies/Bell Labs. (United States)
Raymond A. Cirelli, Lucent Technologies/Bell Labs. (United States)
James R. Sweeney, Lucent Technologies/Bell Labs. (United States)
Myrtle I. Blakey, Lucent Technologies/Bell Labs. (United States)
Joseph E. Griffith, Lucent Technologies/Bell Labs. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top