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Proceedings Paper

Optimal positions for SB assignment and the specification of SB width variation
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Paper Abstract

High NA illumination system and off-axis illumination (OAI) have been shown as two of the most practical resolution enhancement techniques (RET) available for micro-lithography. However, these two illumination approaches may reduce the DOF of iso-patterns. To overcome this problem, scattering bar (SB) assignment has been wildly used. In this paper, the discussions are focused on SB variables of iso-features. The most important variable of SB usage is where is the suitable assignment position. A simply efficient rule has been found to easily catch the optimal position of SB assignment. For OAI illumination, the optimal SB position is exactly the same with the defocus side-lobe position of iso-line. The effect of the secondary pair of SB is also discussed in this paper, and it is found that if the secondary SB pair was not at the optimal position, the process window would be reduced. Another major topic in this paper is the specification of SB width. Here we design a test pattern to target the specification of SB width. The experimental results might give us a clear specification of SB width.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435683
Show Author Affiliations
Chih-Ming Lai, Industrial Technology Research Institute (Taiwan)
Ru-Gun Liu, Industrial Technology Research Institute (Taiwan)
Tsai-Sheng Gau, Industrial Technology Research Institute (Taiwan)
Fu-Jye Liang, Industrial Technology Research Institute (Taiwan)
Shuo-Yen Chou, Industrial Technology Research Institute (Taiwan)
Lin-Hung Shiu, Industrial Technology Research Institute (Taiwan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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