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Proceedings Paper

Design and fabrication of customized illumination patterns for low-k1 lithography: a diffractive approach
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Paper Abstract

As CDs continue to shrink, lithographers are moving more towards using off-axis illumination schemes to increase their CD budget. There have been several papers over the last few years describing various custom illumination profiles designed for application specific optimization. These include various annular and quadrupole illumination schemes including weak quadrupole, CQUEST, and QuasarTM. Traditionally, pupil filtering is used to realize these complex illumination modes but this approach tends to introduce significant light loss. Therefore, compromises are made to lithographic performance to minimize the effect on wafer throughput. Diffractive optics, if incorporated into the design of the illumination system, can be used to create arbitrary illumination profiles without the associated light loss, thus maintaining throughput while optimizing system performance. We report on the design and fabrication of such devices for use with KrF, ArF, and potentially F2 scanners. Extension to I-line steppers is also possible.

Paper Details

Date Published: 14 September 2001
PDF: 7 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435682
Show Author Affiliations
Marc D. Himel, Digital Optics Corp. (United States)
Robert E. Hutchins, Digital Optics Corp. (United States)
Jamey C. Colvin, Digital Optics Corp. (United States)
Menelaos K Poutous, Digital Optics Corp. (United States)
Alan D. Kathman, Digital Optics Corp. (United States)
Adam S. Fedor, Digital Optics Corp. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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