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Proceedings Paper

How lens aberrations influence lithographic imaging and how to reduce their effects
Author(s): Gerhard Kunkel; Wolfgang Henke; Ina Voigt
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Paper Abstract

A method is described to assess the influence of lens aberrations on the image by analyzing the interaction of specific aberrations and diffraction patterns resulting from corresponding mask structures. In order to establish a correlation between the amplitude of individual diffraction orders and specific aberrations, the sensitivity of each diffraction order is investigated separately. The resulting information is used in order to find means to reduce the influence of the aberrations on the diffraction pattern. Several possibilities such as various mask biases, serifs and non-printable assist features can either enhance or decrease the sensitivity to specific aberrations. This method of diffraction order sensitivity study is described and experimentally tested.

Paper Details

Date Published: 14 September 2001
PDF: 12 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435679
Show Author Affiliations
Gerhard Kunkel, Infineon Technologies AG (Germany)
Wolfgang Henke, Infineon Technologies AG (Germany)
Ina Voigt, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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