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Proceedings Paper

Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
Author(s): Marco H. P. Moers; Hans van der Laan; Mark Zellenrath; Wim de Boeij; Neil A. Beaudry; Kevin D. Cummings; Adriaan van Zwol; Arthur Brecht; Rob Willekers
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Paper Abstract

ARTEMISTM (Aberration Ring Test Exposed at Multiple Illumination Settings) is a technique to determine in-situ, full-field, low and high order lens aberrations. In this paper we are analyzing the ARTEMISTM data of PAS5500/750TM DUV Step & Scan systems and its use as a lithographic prediction tool. ARTEMISTM is capable of determining Zernike coefficients up to Z25 with a 3(sigma) reproducibility range from 1.5 to 4.5 nm depending on the aberration type. 3D electric field simulations, that take the extended geometry of the phase shift feature into account, have been used for an improved treatment of the extraction of the spherical Zernike coefficients. Knowledge of the extracted Zernike coefficients allows an accurate prediction of the lithographic performance of the scanner system. This ability is demonstrated for a two bar pattern and an isolation pattern. The RMS difference between the ARTEMISTM-based lithographic prediction and the lithographic measurement is 2.5 nm for the two bar pattern and 3 nm for the isolation pattern. The 3(sigma) reproducibility of the prediction for the two bar pattern is 2.5 nm and 1 nm for the isolation pattern. This is better than the reproducibility of the lithographic measurements themselves.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435676
Show Author Affiliations
Marco H. P. Moers, ASML (Netherlands)
Hans van der Laan, ASML (Netherlands)
Mark Zellenrath, ASML (Netherlands)
Wim de Boeij, ASML (Netherlands)
Neil A. Beaudry, ASML (United States)
Kevin D. Cummings, ASML (United States)
Adriaan van Zwol, ASML (Netherlands)
Arthur Brecht, ASML (Netherlands)
Rob Willekers, ASML (Netherlands)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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