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Proceedings Paper

Detection of focus and spherical aberration by use of a phase grating
Author(s): Joseph P. Kirk; Scott Schank; Chieh-yu Lin
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Paper Abstract

A phase only grating consisting of equal lines of 0 and 90 degree phase is imaged into a highly absorbing photoresist forming a surface relief grating that is measured with a dark- field optical microscope and a CCD array. The resulting images are analyzed to determine spherical aberration, +-0.001 wave RMS, and focus variations of +-2.0 nm. This method of measurement and analysis is applied to both 248 and 193 nm photolithography lenses.

Paper Details

Date Published: 14 September 2001
PDF: 7 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435673
Show Author Affiliations
Joseph P. Kirk, IBM Microelectronics Div. (United States)
Scott Schank, IBM Microelectronics Div. (United States)
Chieh-yu Lin, Infineon Technologies Corp. (United States)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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