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Proceedings Paper

Effect of hole shape error on lithography process window
Author(s): Rakesh Kumar; Moitreyee Mukherjee-Roy; Cher-Huan Tan
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Paper Abstract

Intra-field lens aberrations and distortions affect the shape of contact hole patterning. This effect is more severe with defocus. In this paper, we have studied the effect of difference in horizontal and vertical diameter of a contact hole on the lithography process window for different illumination conditions using a 0.68NA step and scan system. It is found that the depth of focus (DOF) for 0.22um contact hole patterning shrinks considerably taking into account the horizontal and vertical diameter measurements as compared to the average diameter measurements alone.

Paper Details

Date Published: 14 September 2001
PDF: 6 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435672
Show Author Affiliations
Rakesh Kumar, Institute of Microelectronics (Singapore)
Moitreyee Mukherjee-Roy, Institute of Microelectronics (Singapore)
Cher-Huan Tan, Institute of Microelectronics (Singapore)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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