Share Email Print
cover

Proceedings Paper

Testing of optical components for microlithography at 193-nm and 157-nm
Author(s): Klaus R. Mann; Oliver Apel; G. Eckert; Christian Goerling; Uwe Leinhos; Bernd Schaefer
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Absorption loss in UV optics during 193nm and 157nm irradiation is investigated by employing a high-resolution calorimetric technique which allows determining both single and two-photon absorptance at low energy densities. UV calorimetry is also employed to investigate laser induced aging phenomena, e.g. color center formation in fused silica. A separation of transient and cumulative effects can be achieved, giving insight into the loss mechanisms. A strong wavelength dependence of the DUV and VUV absorption characteristics in CaF2 substrates is observed. In addition, Hartmann-Shack wavefront measurements are presented, which allow on-line monitoring of laser-induced compaction in fused silica.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435671
Show Author Affiliations
Klaus R. Mann, Laser-Lab. Goettingen eV (Germany)
Oliver Apel, Laser-Lab. Goettingen eV (Germany)
G. Eckert, Laser-Lab. Goettingen eV (Germany)
Christian Goerling, Laser-Lab. Goettingen eV (Germany)
Uwe Leinhos, Laser-Lab. Goettingen eV (Germany)
Bernd Schaefer, Laser-Lab. Goettingen eV (Germany)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top