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Proceedings Paper

Lens aberration measurement and analysis using a novel pattern
Author(s): Byung-Ho Nam; Byeong-Ho Cho; Jong O Park; Dong-Seok Kim; SungJin Baek; JongHo Jeong; ByungSub Nam; Young Ju Hwang; Young Jin Song
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Paper Abstract

Lens aberration of the exposure tool causes pattern deformation and position shift. As design rule shrinks, the ratio of printed feature size to applied wavelength for optical lithography is driven inexorably toward resolution limit. In this study, we devised an efficient method to evaluate lens aberration using multi-ring pattern on an attenuated phase-shift mask. Adoption of multi-ring pattern can cut down measurement time and improve measurement repeatability. These patterns are uniformly distributed through entire field in 7 by 7 manner. Lens aberration was evaluated by multi-ring pattern array under conventional or off-axis illumination with KrF stepper of NA 0.65. Multi-ring critical dimension (CD) data was discussed together with the issue of lens aberration such as coma, astigmatism, field curvature, etc. We can apply this new measurement technique to select better lens system efficiently. multi-ring, field size, pattern deformation

Paper Details

Date Published: 14 September 2001
PDF: 10 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435665
Show Author Affiliations
Byung-Ho Nam, Hyundai Electronics Industries Co., Ltd. (South Korea)
Byeong-Ho Cho, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jong O Park, Hyundai Electronics Industries Co., Ltd. (South Korea)
Dong-Seok Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
SungJin Baek, Hyundai Electronics Industries Co., Ltd. (South Korea)
JongHo Jeong, Hyundai Electronics Industries Co., Ltd. (South Korea)
ByungSub Nam, Hyundai Electronics Industries Co., Ltd. (South Korea)
Young Ju Hwang, Hyundai Electronics Industries Co., Ltd. (South Korea)
Young Jin Song, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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