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Proceedings Paper

Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography
Author(s): Takashi Saito; Takashi Matsunaga; Ken-ichi Mitsuhashi; Katsutomo Terashima; Takeshi Ohta; Akifumi Tada; Takanobu Ishihara; Masaya Yoshino; Hiroaki Tsushima; Tatsuo Enami; Hitoshi Tomaru; Tatsushi Igarashi
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Paper Abstract

We have developed a 4-kHz ArF excimer laser with ultra-narrow bandwidth, which is applicable to high-NA scanners for sub-0.13-micrometers microlithography. In this paper, we describe a 4-kHz ArF excimer laser for mass production: the model G40A, which has an output power of 20 W and energy dose stability of less than +/- 0.3% (20-ms window) at 4 kHz. This dose stability is comparable to the performance of an existing 2-kHz ArF excimer laser, the model G20A. The new laser also has the following specifications: a long pulse duration of over 40 ns, spectral bandwidth of less than 0.35 pm (FWHM), and spectral purity of less than 1.0 pm (95%). These characteristics are better than those of the G20A. A lifetime test of over 7 billion pulses has been conducted at 4-kHz operation. The new laser has maintained an energy dose stability of less than +/- 0.3% (20-ms windows) and demonstrated performance suitable for mass production even after over 7 billion pulses.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435658
Show Author Affiliations
Takashi Saito, Gigaphoton, Inc. (Japan)
Takashi Matsunaga, Gigaphoton, Inc. (Japan)
Ken-ichi Mitsuhashi, Gigaphoton, Inc. (Japan)
Katsutomo Terashima, Gigaphoton, Inc. (Japan)
Takeshi Ohta, Gigaphoton, Inc. (Japan)
Akifumi Tada, Gigaphoton, Inc. (Japan)
Takanobu Ishihara, Gigaphoton, Inc. (Japan)
Masaya Yoshino, Gigaphoton, Inc. (Japan)
Hiroaki Tsushima, Gigaphoton, Inc. (Japan)
Tatsuo Enami, Gigaphoton, Inc. (Japan)
Hitoshi Tomaru, Gigaphoton, Inc. (Japan)
Tatsushi Igarashi, Gigaphoton, Inc. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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