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Proceedings Paper

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography
Author(s): Kouji Kakizaki; Takashi Matsunaga; Yoichi Sasaki; Toyoharu Inoue; Satoshi Tanaka; Akifumi Tada; Hiroaki Taniguchi; Motohiro Arai; Tatsushi Igarashi
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Paper Abstract

High-repetition-rate ArF excimer lasers are needed to enable high throughput and energy-dose stability in 193-nm scanner systems. Last year we described a 4-kHz ArF excimer laser with long pulse duration, which can narrow the spectral bandwidth by increasing the number of round trips and reduce optical damage from low-peak power. The design of the 4-kHz ArF excimer laser has been improved for mass production. Operating rates exceeding 4 kHz are needed to optimize lasers for next-generation technologies that can enable high NA and the development of high-throughput scanners. We have analyzed the possibilities of achieving repetition rates higher than 4 kHz. The discharge width was reduced by about 25 % with a variation of the electric field at the discharge section, and the gas flow and gas-mixture conditions were improved. As a result, we obtained the following performance characteristics: 42-W average power, 3.5 % pulse-to-pulse energy stability of sigma, and a 44-ns integral-square pulse width at 6 kHz with a bandwidth of below 0.45 pm in FWHM. We concluded that developing 6-kHz ArF excimer lasers for next-generation 193-nm lithography is feasible.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435656
Show Author Affiliations
Kouji Kakizaki, Gigaphoton, Inc. (Japan)
Takashi Matsunaga, Gigaphoton, Inc. (Japan)
Yoichi Sasaki, Gigaphoton, Inc. (Japan)
Toyoharu Inoue, Gigaphoton, Inc. (Japan)
Satoshi Tanaka, Gigaphoton, Inc. (Japan)
Akifumi Tada, Gigaphoton, Inc. (Japan)
Hiroaki Taniguchi, Gigaphoton, Inc. (Japan)
Motohiro Arai, Gigaphoton, Inc. (Japan)
Tatsushi Igarashi, Gigaphoton, Inc. (Japan)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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