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Proceedings Paper

Optimum field-size strategy for DRAM mass production in low-k1 process
Author(s): Chan-Ha Park; Donggyu Yim; Seung-Hyuk Lee; Hyun-Jo Yang; Jae-Hak Choi; Yong-Chul Shin; Choi-Dong Kim; Jae-Sung Choi; Khil-Ohk Kang; Sang-Wook Kim; Dong-Duk Lee; Gyu-Han Yoon
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Paper Abstract

Leading chip makers are now trying to develop 130 nm technology node recently, using 0.70NA KrF lithography, whose k1 factor is 0.37. It is, however, accepted that it is a real challenge to apply low k1 process under 0.40 to mass- production. So, it is desirable to produce with higher k1 factor using such as 0.80NA KrF or 0.75NA ArF lithography. But, these advanced tools being not available yet, some chip makers who wish to produce 130 nm technology node device earlier have to choose low k1 process with 0.70NA KrF lithography. In mass-production, throughput and production yield are the most significant parameters that can define productivity and both parameters should be considered carefully when determining the size of a field. It is possible to organize several chips in a large field for better throughput, however it can cause degradation of CD uniformity, which can result in production yield drop, especially in low k1 process whose process window is not wide enough. On the contrary, using a small field may contribute to higher production yield, but at the expense of throughput. In this study, a model procedure to determine optimum field size by simulating the relative product yield and throughput is introduced for 130 nm technology node mass-production with low k1 process.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435634
Show Author Affiliations
Chan-Ha Park, Hyundai Electronics Industries Co., Ltd. (South Korea)
Donggyu Yim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Seung-Hyuk Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Hyun-Jo Yang, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae-Hak Choi, Hyundai Electronics Industries Co., Ltd. (South Korea)
Yong-Chul Shin, Hyundai Electronics Industries Co., Ltd. (South Korea)
Choi-Dong Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae-Sung Choi, Hyundai Electronics Industries Co., Ltd. (South Korea)
Khil-Ohk Kang, Hyundai Electronics Industries Co., Ltd. (South Korea)
Sang-Wook Kim, Hyundai Electronics Industries Co., Ltd. (South Korea)
Dong-Duk Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Gyu-Han Yoon, Hyundai Electronics Industries Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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