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Proceedings Paper

Carbon antireflective coating (ARC) technology for both KrF and ArF lithography
Author(s): Yongbeom Kim; Junghyun Lee; Hanku Cho; Joo-Tae Moon
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Paper Abstract

In device integration smaller than 0.18 micrometer design rule, application of the ARC (antireflective coating) technology is unavoidable and SiON ARC and organic ARC are well-known materials up to now. In this paper, as an alternative way, new carbon ARC (CARC) material with the properties of easy stripping and good step coverage is presented. The details of its characteristics related to photo, etch and cleaning process and electrical properties after application to the real devices is investigated. The feasibility of the new CARC for both KrF and ArF lithography was confirmed.

Paper Details

Date Published: 14 September 2001
PDF: 9 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435632
Show Author Affiliations
Yongbeom Kim, Samsung Electronics Co., Ltd. (South Korea)
Junghyun Lee, Samsung Electronics Co., Ltd. (South Korea)
Hanku Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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