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Proceedings Paper

Thin film morphology at low adatom mobility
Author(s): Robert A. Knepper; Russell F. Messier
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Paper Abstract

Thin film properties can be engineered by the high degree of control in many CVD and especially PVD processes. In particular, the thin film morphology often has a direct connection between preparation and property relations. This review will focus on understanding the morphology in PVD coatings prepared at low adatom mobilities where columnar thin films are prepared, with the column sizes ranging from nm- to micrometers -sizes and the columns forming hierarchical clusters of columns having a fractal-like behavior. We will discuss the effects of ion bombardments and angle of incidence of the directional vapor species with respect to the morphology origin and evolution. These various morphologies are related to applications ranging from hard coatings to optical coatings to sculptured thin films.

Paper Details

Date Published: 9 July 2001
PDF: 15 pages
Proc. SPIE 4467, Complex Mediums II: Beyond Linear Isotropic Dielectrics, (9 July 2001); doi: 10.1117/12.432957
Show Author Affiliations
Robert A. Knepper, The Pennsylvania State Univ. (United States)
Russell F. Messier, The Pennsylvania State Univ. (United States)

Published in SPIE Proceedings Vol. 4467:
Complex Mediums II: Beyond Linear Isotropic Dielectrics
Akhlesh Lakhtakia; Werner S. Weiglhofer; Ian J. Hodgkinson, Editor(s)

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