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Proceedings Paper

CNx films deposited using combined deposition method: pulsed laser deposition in the RF discharged nitrogen gas
Author(s): J. Bulir; Miroslav Jelinek; Jan Lancok; M. Trchova; K. Jurek
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Paper Abstract

Thin CNx films were deposited by pulsed laser deposition (KrF excimer laser) with additional radio-frequency discharge of the nitrogen gas. Nitrogen pressure was in the range from 1 to 40 Pa and r.f. power was adjusted to 100 W. The substrate temperature was changed in the range from room temperature to 800 degree(s)C. An influence of the substrate temperature on the film composition and structure was studied. The composition of the films was measured by wavelength dispersive x-ray spectroscopy. The N/C ratio of films deposited at room temperature almost reach 1; however, it decreased with increasing substrate temperature. Structure was studied using Fourier transformed infrared spectroscopy analysis. Presence of CequalsC, CequalsN, CequalsVN, N-H and O-H groups was confirmed. Optical properties were analyzed using UV-VIS reflection spectroscopy.

Paper Details

Date Published: 29 June 2001
PDF: 6 pages
Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); doi: 10.1117/12.432850
Show Author Affiliations
J. Bulir, Institute of Physics (Czech Republic)
Miroslav Jelinek, Institute of Physics (Czech Republic)
Jan Lancok, Institute of Physics (Czech Republic)
M. Trchova, Charles Univ. (Czech Republic)
K. Jurek, Institute of Physics (Czech Republic)

Published in SPIE Proceedings Vol. 4430:
ROMOPTO 2000: Sixth Conference on Optics

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