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Proceedings Paper

Simplified model for RMS variation in pulsed laser deposition
Author(s): Aurelian Marcu; Constantin Grigoriu; Kiyoshi Yatsui
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Paper Abstract

In Pulsed Laser Deposition (PLD) surface roughness of a deposited film is an important parameter for many thin films applications. Plume free expansion and propagation in a plane shadow mask experimental setup have been investigated together with film roughness for several deposition parameters. In this paper we propose a simplified formula for a RMS variation. A comparison between theoretical and experimental results is presented. The model is considered to be useful for quick roughness (RMS) estimation in PLD deposition.

Paper Details

Date Published: 29 June 2001
PDF: 6 pages
Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); doi: 10.1117/12.432847
Show Author Affiliations
Aurelian Marcu, National Institute for Laser, Plasma and Radiation Physics (Romania)
Constantin Grigoriu, National Institute for Laser, Plasma and Radiation Physics (Romania)
Kiyoshi Yatsui, Nagaoka Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 4430:
ROMOPTO 2000: Sixth Conference on Optics

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