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Proceedings Paper

Fundamental aspects of photochemical effects in UV laser ablation
Author(s): Athanasia Athannassiou; D. Fragouli; Efi Andreou; Dmitrios Anglos; Savas K. Georgiou; Costas Fotakis
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Paper Abstract

The photochemical effects induced by UV irradiation at 248 nm to highly photosensitive organic compounds embedded into polymer matrices are sutdied in a systematic way using laser induced fluorescence. The nature and intensity of the induced photoproducts are monitored below and above the ablation threshold. Host polymers with different absorption coefficients in the employed wavelength are used in order to study their protective role with regard to the photodissociation of the dopants. The employed dopants are the iodo-derivatives of naphthalene and phenanthrene (NapI and PhenI). Photolysis of the dopants, while they are embedded int he weakly absorbing polymer PMMA, at laser fluences below the ablation threshold is found to result in the formation of naphthalene-like and phenanthrene-like photoproducts, whereas above the threshold, additional photoproducts are clearly observed only in the case of the NapI dopant. The photolysis yields for both dopants exhibit very similar behaviour, increasing sharply above the threshold. In contrast, in the case where the dopants are embedded into the strongly absorbing polymer polystyrene, their photolysis yields reach a limiting value closely above the ablation threshold. Therefore, the absorbing polymer provides a high degree of control over the induced photochemical effects. The finding implies that the photolysis efficiency of the incorporated additives is directly affected by the host polymeric material.

Paper Details

Date Published: 29 June 2001
PDF: 6 pages
Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); doi: 10.1117/12.432834
Show Author Affiliations
Athanasia Athannassiou, Foundation for Research and Technology Hellas (Greece)
D. Fragouli, Foundation for Research and Technology Hellas (Greece)
Efi Andreou, Foundation for Research and Technology Hellas (Greece)
Dmitrios Anglos, Foundation for Research and Technology Hellas (Greece)
Savas K. Georgiou, Foundation for Research and Technology Hellas (Greece)
Costas Fotakis, Foundation for Research and Technology Hellas (Greece)


Published in SPIE Proceedings Vol. 4430:
ROMOPTO 2000: Sixth Conference on Optics

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